TorchResist offers an open-source, differentiable simulator for photoresist processes, addressing critical challenges in semiconductor manufacturing as AI demands push beyond Moore's Law limits.

• Optimizes lithography process through differentiable simulation, reducing costs and improving precision
• Accelerates semiconductor development by providing an open-source alternative to proprietary software
• Enables AI-driven innovation in chip design and manufacturing processes
• Supports next-generation computing hardware needed for advanced AI systems

This engineering breakthrough helps bridge the gap between growing computational demands and manufacturing capabilities, potentially unlocking more efficient paths to semiconductor innovation.

TorchResist: Open-Source Differentiable Resist Simulator